成果归属作者：

付志强

成果归属机构：

工程技术学院

作者：

Jiang, Yuanxin ; Liu, Yi ; Xie, Qi ; Yang, Sen ; Luo, Tianyong ; Fu, Zhiqiang

单位：

Univ Elect Sci & Technol China, Sch Mech & Elect Engn, Chengdu 611731, Peoples R China;Univ Elect Sci & Technol China, Sch Mat & Energy, Chengdu 611731, Peoples R China;China Univ Geosci Beijing, Sch Engn & Technol, Beijing 100083, Peoples R China;Univ Sci & Technol Beijing, Sch Mat Sci & Engn, Beijing 100084, Peoples R China

关键词：

FUSION; COATINGS; CVD; ADHESION; IRRADIATION; EXPOSURE

摘要：

To explore the potential application of diamond coating on the surface modification of graphite-based plasmafacing components in nuclear fusion, the retention of hydrogen irradiated into diamond film deposited by HFCVD was studied. After being attacked with 200 eV hydrogen ions for 10 h at 200 degrees C, this diamond layer was observed to maintain the stability of crystal structure. The C-H absorption peaks in the FTIR spectrum that were conspicuous in the sole graphite were absent in the diamond surface subjected to the same quantity of hydrogen irradiation, suggesting that the implanted hydrogen was difficult to penetrate or persist in the diamond covering. Further computational studies have demonstrated that hydrogen atoms exhibit a low propensity for retention within the diamond (11 1), in contrast to reside stably in graphite or graphite-like structures. The above shows that HFCVD diamond film has strong resistance to hydrogen retention and structural stability under hydrogen irradiation.

基金：

Langfang Supower Diamond Technology Co. Ltd

语种：

英文

DOI：

10.1016/j.anucene.2024.110725

来源：

ANNALS OF NUCLEAR ENERGY,2024():.

出版日期：

2024-11

提交日期：

2024-08-17

引用参考：

Jiang, Yuanxin; Liu, Yi; Xie, Qi; Yang, Sen; Luo, Tianyong; Fu, Zhiqiang. Study on hydrogen retention resistance of diamond film by HFCVD[J]. ANNALS OF NUCLEAR ENERGY,2024():.